Model assumptions
The Si oxide on Si sample is synthetic. Both layers are assumed to have the same Si number density and a common 2 nm escape length, with ideal exponential escape and no elastic scattering. The lines sit at 99.4 and 103.5 eV for Si and 532.9 eV for O. The two Gaussian Si doublets have a 0.63 eV splitting and a 2:1 area ratio. Intrinsic widths, the continuum, the count scale and the relative sensitivities of 1 and 2.9 are teaching assumptions, not an instrument calibration. The Al and Mg source presets change the kinetic energy, while the assumed sensitivities and escape lengths stay fixed. A uniform positive potential on the sample raises every apparent binding energy, and neutralization sets how much of that potential remains. Weighted, constrained fits estimate the peak areas and a common shift from the recorded counts. The background is a smooth linear or quadratic continuum, not Shirley or Tougaard. You supply the reference correction. Here the Si anchor line can serve as a known substrate reference, but it is never a universal charge reference. The reported oxygen percentage is a surface-weighted, two-element equivalent; it is not bulk stoichiometry or an inverted depth profile. The survey and the high-resolution scans are recorded separately and have independent counting noise. Each exposure is taken as the integration time for one scan; animation and processing add no exposure. Noise is Poisson below 40 expected counts and a rounded Gaussian approximation above. The apparatus shows a fixed window of raw energies; fitting windows and reference corrections affect only the analysis. The analyzer width is a Gaussian equivalent for a 150 mm mean radius and a 2-degree entrance half-angle. Differential charging, satellites, Auger peaks, damage, real cross sections, exact electron optics and general chemical identification are left out.